The global Extreme Ultraviolet Lithography (EUVL) market size was USD 3.12 Billion in 2021 and is expected to register a revenue CAGR of 27.07% during the forecast period, according to the latest analysis by Emergen Research. The rising demand for Laser Produced Plasma (LPP) for light sourcing is projected to support market revenue growth between 2021 and 2030. To accelerate particles and produce brief x-ray bursts, laser-produced plasmas are used. In addition, they help simulate astronomical plasmas in laboratories. Molten tin droplets around 25 microns in diameter are blasted from a generator at 70 meters per second in an LPP source. The droplets are initially hit by a weak laser pulse as they descend, which gives them a pancake shape. The flattened droplet is then vaporized by a stronger laser pulse, forming a plasma that releases EUV light. This procedure is carried out 50,000 times per second in order to generate enough light to create microchips. LPP has high output power and Conversion Efficiency (CE), which makes them a promising alternative for EUVL sources. For example, the NXE:3400B EUV scanner setting CO2 LPP system from ASML is now deployed and in use by chipmaker customers.
The latest research report, titled ‘Global Extreme Ultraviolet Lithography Market’, can be considered a profound analysis of the global Extreme Ultraviolet Lithography Market that focuses on crucial data and information pertaining to the sales and revenue shares. The market evaluations over the forecast years are based on a comprehensive analysis of the leading market segments, such as product type outlook, application continuum, regional overview, and competitive landscape of the global Extreme Ultraviolet Lithography Market.
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Competitive Terrain:
The global Extreme Ultraviolet Lithography industry is highly consolidated owing to the presence of renowned companies operating across several international and local segments of the market. These players dominate the industry in terms of their strong geographical reach and a large number of production facilities. The companies are intensely competitive against one another and excel in their individual technological capabilities, as well as product development, innovation, and product pricing strategies.
The leading market contenders listed in the report are:
ASML, Tokyo Electron Limited, Samsung, Taiwan Semiconductor Manufacturing Company, Intel Corporation, NTT Advanced Technology Corporation, Nikon Corporation, Toshiba Corporation, Toppan Inc., Canon Inc., and ZEISS International
Additional information offered by the report:
- Along with a complete overview of the global Extreme Ultraviolet Lithography market, the report provides detailed scrutiny of the diverse market trends observed on both regional and global levels.
- The report elaborates on the global Extreme Ultraviolet Lithography market size and share governed by the major geographies.
- It performs a precise market growth forecast analysis, cost analysis, and a study of the micro- and macro-economic indicators.
- It further presents a detailed description of the company profiles of the key market contenders.
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Segments Covered in this report are:
-
Equipment Outlook (Revenue, USD Billion; 2019–2030)
- Light Source
- Mask
- Mirrors
- Others
-
End-Use Outlook (Revenue, USD Billion; 2019–2030)
- Integrated Device Manufacturers (IDMs)
- Foundry
- Others
-
Regional Outlook (Revenue, USD Billion; 2019–2030)
- North America
- U.S.
- Canada
- Mexico
- Europe
- Germany
- France
- U.K.
- Italy
- Spain
- Benelux
- Rest of Europe
- Asia Pacific
- China
- India
- Japan
- South Korea
- Rest of APAC
- Latin America
- Brazil
- Rest of LATAM
- Middle East & Africa
- Saudi Arabia
- UAE
- South Africa
- Turkey
- Rest of Middle East & Africa
- North America
Radical Highlights of the Extreme Ultraviolet Lithography Market Report:
- Comprehensive overview of the Extreme Ultraviolet Lithography market along with analysis of the changing dynamics of the market
- Growth Assessment of various market segments throughout the forecast period
- Regional and global analysis of the market players, including their market share and global position
- Growth strategies adopted by key market players to combat the impact of the COVID-19 pandemic on the market
- Impact of the technological developments and R&D advancements on the Extreme Ultraviolet Lithography market
- Information about profit-making strategies and developmental strategies of major companies and manufacturers
- Insightful information for the new entrants willing to enter the market
- Details and insights about business expansion strategies, product launches, and other collaborations
- The report incorporates advanced analytical tools such as SWOT analysis, Porter’s Five Forces Analysis, feasibility analysis, and investment return analysis
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